High borosilicate iav(tseem hu ua iav tawv), yog tus cwj pwm los ntawm kev siv iav los ua hluav taws xob ntawm qhov kub thiab txias. Lub khob yog yaj los ntawm cua sov sab hauv ntawm lub khob thiab ua tiav los ntawm cov txheej txheem ntau lawm.
Qhov coefficient rau thermal expansion yog (3.3 ± 0.1) x 10-6/K, tseem hu ua "borosilicate iav 3.3". Nws yog cov khoom siv iav tshwj xeeb uas tsis tshua muaj qhov nthuav dav, kub tsis kam, siab zog, siab hardness, siab lub teeb
transmittance thiab siab tshuaj stability. Vim nws txoj kev ua tau zoo heev, nws tau siv dav hauv hnub ci zog, tshuaj lom neeg kev lag luam, ntim tshuaj, hluav taws xob lub teeb, khoom siv tes ua khoom siv tes ua thiab lwm yam lag luam.
Cov ntsiab lus Silicon | > 80% |
Qhov ceev (20 ℃) | 3.3 * 10-6/K |
Coefficient ntawm Thermal Expansion (20-300 ℃) | 2.23g / cm33 |
Kub ua haujlwm kub (104dpas) | 1220 ℃ |
Annealing kub | 560 ℃ |
Softening Kub | 820 ℃ |
Refractive Index | 1.47 ib |
Thermal conductivity | 1, 2 wm-1K-1 |
Post lub sij hawm: Oct-22-2019